Science and Technology

Thin Film Deposition

Our Thin Film Deposition equipment includes three RF-Magnetron Sputter deposition systems suitable for controlled deposition and vacuum annealing of a range of dielectric, metal and phosphor materials, annealing at temperatures up to 700°C with substrate size - 100mm diameter or smaller.

Typical materials deposited:

• thin film phosphors for displays and sensors
  • ZnS:Mn
  • SrS:Cu,Ag
  • Y2O3:Eu
  • ZnS:Ag
  • ZnO
• Dielectrics
  • Y¬2O3
  • SiN
• Transparent Conductors
  • ITO
  • SnO:Sb
  • (Aluminium metal can be deposited by thermal evaporation)

To discuss your specific requirements in detail, please contact Gordon Arnott at SS2i or call us on +44(0)115 848 8665