Do you need to look at the nano or microscale structure of a surface or a material? Perhaps you need to map how different elements make up the surface or the material? Do you have biological materials which you need to look at with a high power microscope?
Nottingham Trent University is funding a pilot project to increase its engagement with industry. The project will allow our experts to work with you and to establish a commercial relationship to obtain your future analytical needs. This pilot is focussed on advanced imaging but there is also an extensive suite of state-of-the-art analysis tools available.
Our Services Include:·
Jeol SEM JSM-7100F + EDX (Resolution:1.2nm guaranteed at 30Kv, 3.0nm guaranteed at 30Kv; Probe current: 1 x 10-12A to 2 x 10-7A; Element mapping);
Jeol JEM 2010 TEM (Resolution:1.4Å (lattice) and 1.94Å (point to point); Magnification at 200Kv: standard 2000x to 1,500,000x, low magnification 50x to 1000x);
Dimension ICON AFM (Material Mapping: QNM mode 1MPa to 50GPa for modulus, 10pN to 10μN for adhesion; Nanoindentation; Imaging: Tapping mode, QNM, Contact mode);
Olympus Microscope BX51 (Magnifications: 2.5x to 100x; Filters: DAPI, Bright field, Red, Dark field).
Jeol SEM JSM-7100F + EDX
AFM modes Standard
ScanAsyst, PeakForce Tapping, TappingMode (air), Contact Mode, Lateral Force Microscopy, PhaseImaging, Lift Mode, MFM, Force Spectroscopy, Force Volume, EFM, Surface Potential, Piezoresponse Microscopy, Force Spectroscopy; Optional: PeakForce QNM, HarmoniX, Nanoindentation, Nanomanipulation, Nanolithograpy, Force Modulation (air/fluid), TappingMode (fluid), Torsional Resonance Mode, Dark Lift, STM, SCM, C-AFM, SSRM,PeakForce TUNA,TUNA, TR-TUNA, VITA.
X-Y scan range 90µm x 90µm typical, 85µm minimum
Z range 10µm typical in imaging and force curve modes, 9.5µm minimum
Vertical noise floor <30pm RMS in appropriate environment typical imaging bandwidth (up to 625Hz)
X-Y position noise (closed-loop) ≤0.15nm RMS typical imaging bandwidth (up to 625Hz)
X-Y position noise (open-loop) ≤0.10nm RMS typical imaging bandwidth (up to 625Hz)
Z sensor noise level (closed-loop) 35pm RMS typical imaging bandwidth (up to 625Hz); 50pm RMS, force curve bandwidth (0.1Hz to 5kHz)
Integral nonlinearity (X-Y-Z) <0.5% typical
Sample size/holder 210mm vacuum chuck for samples, ≤210mm diameter, ≤15mm thick
Motorized position stage (X-Y axis) 180mm × 150mm inspectable area; 2µm repeatability, unidirectional; 3µm repeatability, bidirectional
Microscopeoptics 5-megapixel digital camera; 180µm to 1465µm viewing area; Digital zoom and motorised focus
Controller NanoScope V
Workstation Integrates all controllers and provides ergonomic design with immediate physical and visual access
Vibration isolation Integrated, pneumatic; Acoustic isolation, operational in environments with up to 85dBC continuous acoustic noise
Jeol JEM 2010 TEM
The FE-SEM consists of a high resolution field emission electron column. This allows for high magnification and resolution imaging using electrons. The unique high power optics of JSM-7100F guarantees 1.2nm resolution. High magnification for the study of nano-structures is easily obtained.
Magnetic specimens The objective lens of the JSM-7100F does not form a magnetic field around a specimen. Magnetic specimens can be observed and analysed without restriction.
Analysis of nano-structures A small probe diameter is obtained with the patented aperture angle optimising lens. You can acquire high precision analyses and high quality elemental maps in a short time by using a large probe current. A variety of analytical equipment including EDS, WDS, and EBSD can be mounted for their ideal geometry.
Clean vacuum A specimen is introduced through the specimen exchange airlock chamber. The specimen chamber is always kept in a clean, high vacuum. The unique one-action specimen exchange mechanism lets you insert and remove a specimen with simple operation. The specimen chamber is pumped with a TMP.
In-lens thermal FEG The patented in-lens thermal FEG is efficient and produces a maximum probe current of 200nA.
Resolution of secondary electron image (SEI) 1.2 nm guaranteed at 30 kV , 3.0 nm guaranteed at 1 kV, Probe current: 1xl0–12 to 2xl0–7 A
Typical Applications Observe the finest structural morphology of nanomaterials at 1,000,000X magnification with sub-1nm resolution. Collect large area EBSD maps at low magnifications without distortion. Perform low kV imaging and analysis of highly magnetic samples. Large area EDS (EDX) is available for chemical composition analysis. Low Vacuum operation capability.
Dimension ICON AFM
Performance Guaranteed resolution: 1.4 Å (lattice) and 1.94 Å (point to point) Accelerating voltage: 80, 100, 120, 160, 200 kV
Magnification (at 200kV) Standard magnification mode: 2,000× to 1,500,000×; Selected area magnification mode: 2,000× to 1,500,000×; Low magnification mode (LOW MAG): 50× to 1,000×
Electron diffraction camera length Selected area electron diffraction: 8 to 200 cm
Electron optics system Illumination system includes the electron gun and condenser lens. The electron gun (multi-stage beam stage) is a standard self-biasing LaB6 filament. The condenser lens system is four stage condenser lens: 1st, 2nd, 3rd, and mini-lens.The condenser aperture sizes are 10, 20, 50, 70, and 120 µm in diameter. The imaging forming system includes an objective lens, 1st and 2nd intermediate lens and a projective lens. The ultra-high resolution (UHR) pole piece is used in the objective lens. The objective aperture sizes are 20, 40, 60 and 120 µm in diameter. SAD aperture sizes are 10, 20, 50 and 100 µm in diameter. In Low-Mag mode, the objective lens is turned off and the objective mini-lens is active.
Specimen stage Specimen holder is exchanged with airlock mechanism with two stage evacuation. X, Y, Z and X tilt are all motor-driven. The movement range of X and Y directions is ± 1 mm. The specimen tilt angle is ±15º for both X tilt and Y tilt.
Vacuum system It includes an oil rotary pump, an oil diffusion pump, and a sputter ion pump (SIP). The diffusion pump is for pumping the specimen chamber and the camera chamber, and the SIP is for the pumping the column and gun chamber.
Olympus Microscope BX51
Olympus bx51 fluorescence microscope:
- 3 position trinocular head (100% eyes/ 100%camera/ split between eyes & camera)
- 10x widefield eyepieces
- plan 4x objective
- uplanfl 10x objective
- uplanfl 20x objective
- uplanfl 40x objective
- plan 100x oil immersion objective
- bx-ura2 fluorescence illuminator with rotatable front 6 cube turret
- exfo x-cite 120 fluorescence illumination system
- 100 watt quartz halogen lamphouse for transmitted light
- 6 place nosepiece with analyser slot
- abbe type condenser
- right handed mechanical x y stage w/slider holder
If you would like to know how to access NTU’s expertise and facilities for advanced microscopy analysis, how the technology could assist in your research and development, or if you would just like an informal discussion on the technology and its application please contact...
Dr Enzo Fornari, E: firstname.lastname@example.org, M: (+44) 07856187012
Dr Enzo Fornari, School of Science and Technology, Nottingham Trent University.